Trichlorosilane (SiHCl3) is a chlorosilane which is formed by reaction of metallic silicon or ferrosilicon with hydrogen chloride.
High-purity Trichlorosilane is the most important raw material for the production of solar and semiconductor silicon. Trichlorosilane is widely used for the deposition of epitactic silicon layers on silicon wafers in semiconductor production. Trichlorosilane is also used as starting material for organosilicon compounds. Evonik offers a large number of organosilanes under the Dynasylan® trademark.